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製品名:
BGC
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化学物質のA-Z
> semiconductor
ための製品検索: semiconductor
カテゴリーに基づいて、 semiconductor
:
acetate
acetic
acid
agent
ammonia
ammonium
ammoniumfluoride
anhydrous
borate
boron
buffer
buffered
butylether
butyletheracetate
chloride
choline
chrom
chromium
compound
cooh
cyanide
defreckle
developer
diethylaminotrimethylsilane
dimethylformamide
dmso
epoxy
etch
etchant
etching
ethanol
ether
ethylene
ethylmethyl
fluoride
gallium
glycol
grade
hexachlorostannate
hydrochloric
hydrofluoric
hydrogen
hydroxide
ketone
metal
methanol
miak
mixed
mixture
modified
molding
monomethyl
monomethylether
negativ
negative
nitric
orthophosphoric
oxide
pentoxide
perfluorocyclobutane
peroxide
pgmea
phosphoric
phosphorus
phosphoryl
positive
potassium
propylene
puranal
resist
rinse
silicon
siodop
sioget
slsi
solution
solvent
spinetch
stripper
teos
tetraethoxysilane
tetramethylammonium
toluene
triethyl
trioxide
vlsi
xylene
IUPAC名。
CAS
EINECS
式
Sioget for semiconductor
Siodop for semiconductor
Xylene for semiconductor
1330-20-7
215-535-7
C
8
H
1
0
Ethanol for semiconductor
64-17-5
200-578-6
C
2
H
5
OH
Toluene for semiconductor
108-88-3
203-625-9
C
7
H
8
Spinetch for semiconductor
Methanol for semiconductor
67-56-1
200-659-6
CH
3
OH
Developer for semiconductor
PBS rinse for semiconductor
Chrom-Etch for semiconductor
Nitric acid for semiconductor
7697-37-2
231-714-2
HNO
3
Solvent EEP for semiconductor
763-69-9
212-112-9
C
7
H
1
4
O
3
ITO-etchant for semiconductor
HNO3-etchant for semiconductor
BOE 40:1 LST for semiconductor
PBS developer for semiconductor
NH4-F-etchant for semiconductor
H3PO4-etchant for semiconductor
Solvent NMP-AE for semiconductor
Solvent EG-APB for semiconductor
di-n-Butylether for semiconductor
142-96-1
205-575-3
C
8
H
1
8
O
Ethylene glycol for semiconductor
107-21-1
C
2
H
6
O
2
Solvent DEK-DEM for semiconductor
Defreckle etch 2 for semiconductor
Solvent MIAK-MPK for semiconductor
Ammonia solution for semiconductor
7664-41-7
231-635-3
NH
3
Solvent HXL-MIAK for semiconductor
Ammonium fluoride for semiconductor
12125-01-8
235-185-9
NH
4
F
Anhydrous Etchant for semiconductor
Potassium cyanide for semiconductor
151-50-8
205-792-3
KCN
Hydrogen peroxide for semiconductor
7722-84-1
231-765-0
H
2
O
2
di-Boron trioxide for semiconductor
1303-86-2
215-125-8
B
2
O
3
Hydrochloric acid for semiconductor
7647-01-0
231-595-7
HCl
Solvent DMSO-DMA-F for semiconductor
Ethylmethyl ketone for semiconductor
78-93-3
201-159-0
C
4
H
8
O
Hydrofluoric acid for semiconductor
Phosphoryl chloride for semiconductor
10025-87-3
233-046-7
POCl
3
Nitric acid etchant for semiconductor
Molding compound mp for semiconductors
Choline developer 5% for semiconductor
Silicon etching agent for semiconductor
Triethyl borate (TEB) for semiconductor
150-46-9
205-760-9
C
6
H
1
5
BO
3
N,N-Dimethylformamide for semiconductor
68-12-2
200-679-5
C
3
H
7
NO
di-Phosphorus pentoxide for semiconductor
1314-56-3
215-236-1
P
2
O
5
Ammonium acetate buffer for semiconductor
631-61-8
211-162-9
C
2
H
7
NO
2
Etching mixture NH4F-HF for semiconductor
Phosphoric acid etchant for semiconductor
Chromium etching mixture for semiconductor
Negative Resist Stripper for semiconductor
Positive Resist Stripper for semiconductor
Gallium metal semiconductor grade 99.9999%
7440-55-3
231-163-8
Ga
Tetraethoxysilane (TEOS) for semiconductor
78-10-4
201-083-8
C
8
H
2
0
O
4
Si
Oxide etch 7 / 1 modified for semiconductor
Orthophosphoric acid 85 % for semiconductor
7664-38-2
231-633-2
H
3
PO
4
Etching mixture H3PO4-HNO3 for semiconductor
Mixed acid etchant NH4F-HF for semiconductor
Buffered oxide etch 50 / 1 for semiconductor
Ammonium hexachlorostannate for semiconductor
16960-53-5
241-033-2
(NH
4
)
2
SnCl
6
Etching mixture NH4F-CH3COOH for semiconductor
Ammonium hydroxide solution semiconductor grade
1336-21-6
215-647-6
NH
3
Epoxy molding compound mc-10 for semiconductors
SN-12 negativ resist stripper for semiconductor
N,N-Diethylaminotrimethylsilane for semiconductor
996-50-9
213-637-6
C
7
H
1
9
NSi
Etching mixture HNO3-CH3COOH-HF for semiconductor
Perfluorocyclobutane; 99.998% semiconductor grade
115-25-3
204-075-2
C
4
F
8
Ethylene glycol monomethyl ether for semiconductor
109-86-4
203-713-7
C
3
H
8
O
2
Etching mixture H3PO4-CH3COOH-HNO3 for semiconductor
Tetramethylammonium hydroxide 25 % for semiconductor
75-59-2
200-882-9
(CH
3
)
4
N-OH
Propylene glycol n-butyletheracetate for semiconductor
Hydrofluoric acid 50 % Semiconductor Grade VLSI PURANAL®
Hydrofluoric acid 49 % Semiconductor Grade SLSI PURANAL®
Ammoniumfluoride - hydrofluoric acid etchant for semiconductor
Etching mixture ammonium fluoride/acetic acid for semiconductor
Etching mixture nitric acid/ammonium fluoride for semiconductor
Etching mixture phosphoric acid/nitric acid(65) for semiconductor
Propylene glycol monomethylether acetate (PGMEA) for semiconductor
108-65-6
203-603-9
C
6
H
1
2
O
3
Etching mixture ammonium fluoride/hydrofluoric acid for semiconductor
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